Releasing two metrology systems, a manufacturer could participate in that major investment cycle. Both the registration metrology system LMS IPRO3 and the CD measurement system LWM9000 SEM have set track records.
According to the actual dilemma of the mask maker to meet the extremely tight linewidth specifications for the 65 nm node reticles, the majority of QC investment into metrology systems is spent for CD measurement capability. Despite the fact that CD control is very critical and a bottle neck in state-of-the-art mask manufacturing, pattern placement control (often also referred to as “registration metrology”) is very important as well. However, the actual requirements versus number of measurements per reticle is much more relaxed and, therefore, most mask shops need only one registration metrology system of each tool generation. The LMS IPRO3 is a high end device, designed to support mask metrology for the 65 nm technology node and beyond.
While deliveries of the actual metrology systems for the 65 nm node continue, Vistec is in discussion with leading-edge customers regarding their requirements for the next generation tools. Besides the even tighter and extended metrology performance specifications for the 45 nm node, it already becomes clear that the requirements versus particle contamination will be significantly tighter for the next generation tools.
LMS IPRO3 is a product of Leica Microsystems Semiconductor which is now Vistec Semiconductor Systems. The name change is a result of last year’s takeover of Leica’s semiconductor business.
EPP EUROPE 421
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