All major obstacles to manufacturing 157nm optical lithography have been overcome, and the semiconductor industry is planning for insertion of 157nm lithography, according to experts attending the Third International Symposium on 157nm lithography, held in Antwerp, Belgium. Reportedly, the designs for the first-generation exposure tools have now been fixed, and suppliers’ commitment to delivering the first 157nm scanners in 2004 is highly encouraging. Major progress has also been achieved in resist technology. Resists with increased transparency and improved imaging characteristics have been reported. The symposium was organized by Selete and Sematech in co-operation with the European IMEC institute.
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