Capable of throughputs in excess of 60 wafers per hour, Mentor DF3 tool has a small-footprint of only 2 m² and provides nanotechnology weight measurement of product, test and blanket wafers independent of substrate size or material. Mentor DF3 is designed to monitor changes in process performance and quickly determine whether device manufacture process steps are operating correctly. This tool enables process changes to be reliably and accurately determined after deposition, wet or dry etch or CMP processing.
EPP EUROPE 449
