Addressing the huge challenges, IMEC plans to set up a centralized 300mm research platform. The goal is to demonstrate device architectures and to perform R&D on process steps and equipment, and the advanced research will run 2 to 3 technology nodes ahead of manufacturing. The R&D fab will be very flexible and operate at ultra-short cycle time. It will be built around one of the most advanced lithography clusters such as 157nm and EUV. To share common installations, infrastructure, metrology tools and human resources, the fab will be located adjacent to current IMEC facilities. The institute will continue its successful business model, based on a sharing of cost, risk, talent and IP. Strategic long-term partnerships with a core set of equipment suppliers and major IC manufacturers will be set up to carry the investments. Gilbert Declerck, president/CEO of IMEC stated that, ”With this state-of-the-art 300mm research platform we and our partners will be ready to tackle the challenges of the next decade.” This lab will also allow freeing space in the current 200mm clean room to perform research in a broad range of nanotechnology domains. Nanotechnology will be important in preparation of the post-silicon era and will lead to various different applications.
