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    Startseite/Semiconductor-packaging/Artikel
    First Aluminum Nitride Crystal with 43 mm Diameter
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    Semiconductor-packaging

    First Aluminum Nitride Crystal with 43 mm Diameter

    At German based Fraunhofer Institute for Integrated Systems and Device Technology (Fraunhofer IISB) an aluminum nitride (AlN) crystal with a diameter of
    Veröffentlicht
    11. September 2022
    Lesezeit
    1 Minute
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    Semiconductor-packaging

    This achievement was possible by the support of the BMBF FMD initiative.

    The availability of AlN crystals respectively AlN wafers in sufficient size and quality is the key for the manufacturing of high performance AlN-based electronic devices.

    Aluminum nitride as a semiconductor offers an extreme breakdown field strength, a high material quality, a low amount of defects and a very good thermal conductivity.

    Due to the special physical properties of AlN, AlN-based devices for power electronics can achieve a performance beyond that of silicon carbide (SiC) and gallium nitride (GaN).

    Thus, AlN is suitable for the processing of super-low loss power transistors and has the potential to become the most important Ultra Wide Band Gap (UWBG) semiconductor for power electronics in the future.

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