The photoimageable, aqueous-alkaline developable 1-pack etch resist Elpemer RC 2054 HR by Lackwerke Peter offers an excellent resolution up to 25 µm (Index HR = high resolution) combined with a high efficiency thanks to fast drying, ultra-low exposure energy and short stripping times. It is a cost-saving alternative to dry resists and enables very high first-pass yields compared to the standard liquid resists available on the market.
The Photoresist can be applied by roller coating (Index RC), curtain coating or dipping. It is free of filling agents and pigments which ensures good mileage. Moreover, no unwanted sediment settles in the developer, minimising cleaning efforts. After application – even of thin layers – a very uniform ink film results due to the excellent wetting and flow properties. The dry surface is totally tack-free and thus ideal to stack. Its exceptional scratch and abrasion resistance reduces the potential of mechanical damage. During exposure, the colour indicator formulated in the photoresist effects a significant, intense colour change of the exposed areas from colourless transparent to blue-violet transparent enabling a good visual control of the completeness and resolution of the layout even prior to developing.
EPP EUROPE 535
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