BTU International introduces the Tritan HV90 metallization firing system for silicon photovoltaics. The dual-lane metallization firing system features increased throughput at 3600 wafers per hour, an edge belt, volatile organic compound (VOC) abatement and a single zone spike with less than 3 seconds spike time. “The HV90 is a dual-lane firing furnace that is optimized for volume production,” said Bob Bouchard, product marketing manager for metallization products. “Dual-lane processing is a tremendous leap forward in the race to lower cost per watt. Customers switching to dual-lane can expect a 35 percent increase in capital efficiency and with the Tritan HV90’s unparalleled performance in lane to lane matching, there is really no reason to wait,” added Bouchard. The system features the company’s TriSpeed technology, allowing users to take advantage of superior ramp rates up to 200º C per second while not compromising the drying and cooling sections of the profile. The three-belt system provides control of profile development. In trials, Tritan has consistently shown an improvement in fill factor resulting in increased efficiency. This, combined with the low cost of ownership, enables customers to achieve the lowest cost per watt.
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